Device quality SiO2 films by liquid phase deposition (LPD) at 48°C

Date

2002

Authors

Manhas, M.
Pease, T. J.
Cross, R. B. M.
Bose, S. C.
Oxley, D. P.
De Souza, M. M.
Sankara Narayanan, E. M.

Advisors

Journal Title

Journal ISSN

ISSN

DOI

https://doi.org/10.1557/PROC-716-B7.9

Volume Title

Publisher

Type

Conference

Peer reviewed

Yes

Abstract

Description

Keywords

Citation

Manhas, M. et al. (2002) Device quality SiO2 films by liquid phase deposition (LPD) at 48°C. Materials Research Society Symposium - Proceedings. 716, pp. 317-323.

URI

http://hdl.handle.net/2086/9246

Rights

Research Institute

Collections

School of Engineering and Sustainable Development