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dc.contributor.authorSait, R. A.en
dc.contributor.authorGovindarajan, S.en
dc.contributor.authorCross, R. B. M.en
dc.date.accessioned2018-11-01T14:24:25Z
dc.date.available2018-11-01T14:24:25Z
dc.date.issued2018-09-18
dc.identifier.citationSait, R., Govindarajan, S. and Cross, R. (2018) Nitridation of optimised TiO2 nanorods through PECVD towards neural electrode application. Materialia, 4, pp. 127-138en
dc.identifier.issn2589-1529
dc.identifier.urihttp://hdl.handle.net/2086/16996
dc.descriptionThe file attached to this record is the author's final peer reviewed version. The Publisher's final version can be found by following the DOI link.en
dc.description.abstractA neural electrode interface material is a key component for effective stimulation and recording of neuralactivity. The fundamental requirement of a neural electrode is for it to be able to deliver adequate charge to targeted neuronal population. Coating electrode surfaces with nanostructured material not only provides an increase in surface area, providing relatively more active sites for charge delivery than planar systems, but also allows for the reduction of electrode dimension to reduce invasiveness and increase selectivity. In this work, titanium nitride nanowires (TiN-NWs) synthesised by novel nitridation process in Plasma Enhanced Chemical Vapour Deposition (PECVD) is suggested as an enhanced coating material for neural electrodes. The synthesis involved the solution growth of crystalline titanium oxide nanorods (TiO⁠2-NRs) from a sputtered TiN nucleation layer followed by nitridation. TiO⁠2-NRs exhibited high aspect ratio of 23.1 and were converted into TiN after one hour of nitridation at 600°C. Evidence of conversion was studied by Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and Transmission electron microscopy (TEM). The nitridation temperature and time reported here are the lowest and shortest as compared to the literature. The near-stoichiometric TiN-NWs (x=0.49) achieved in this work were used subsequently for electrochemical characterisation through Cyclic Voltammetry (CV). The capacitance of relatively high aspect TiN-NWs was 3.78mF/cm⁠2⁠, which was a 5-fold enhancement compared to thin film of TiN layer (0.7 mF/cm⁠2). A stability test of the nanowires were performed in which the capacitance remained relatively unchanged.en
dc.language.isoenen
dc.publisherElsevieren
dc.subjectTitanium nitrideen
dc.subjectHigh aspect ratioen
dc.subjectPECVD XPSen
dc.subjectCyclic voltammetryen
dc.titleNitridation of optimised TiO⁠2 nanorods through PECVD towards neural electrode applicationen
dc.typeArticleen
dc.identifier.doihttps://doi.org/10.1016/j.mtla.2018.09.015
dc.researchgroupEmerging Technologies Research Centreen
dc.peerreviewedYesen
dc.funderN/Aen
dc.projectidN/Aen
dc.cclicenceCC-BY-NCen
dc.date.acceptance2018-09-11en
dc.researchinstituteInstitute of Engineering Sciences (IES)en


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